Jiangsu Chaori Purification Technology Co., Ltd.

Epitaxial chip exhaust

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Laboratory Exhaust Gas Treatment Equipment

Industrial exhaust treatment systems designed for laboratory and epitaxial furnace exhaust streams containing SiO? dust, particulate matter, and water-soluble pollutants. Widely used in semiconductor, photovoltaic, and laboratory process environments.

Engineering Capabilities

20+ Years Experience: Proven industrial exhaust gas treatment system design and manufacturing capability.

High Purification Efficiency: Dust and waste gas purification efficiency can reach up to 99% under proper operating conditions.

Dual Spray Washing Structure: Two spray washing chambers combined with a packed column chamber ensure stable purification performance.

Enhanced Airflow Design: Auxiliary fan suction increases system airflow capacity and improves exhaust treatment stability.

Low Energy Consumption: Low resistance structure provides low energy consumption and low noise operation.

ISO 9001:2015 Certified: Quality management applied throughout equipment design and manufacturing.

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